| 空心阴极放电膏剂离子渗硼及其性能研究 |
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| 引用本文： | 赵晋香,高原.空心阴极放电膏剂离子渗硼及其性能研究[J].太原理工大学学报,1998,29(6):616-619. |
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| 作者姓名： | 赵晋香 高原 |
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| 作者单位： | 太原理工大学表面工程研究所 |
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| 摘 要： | 论述了在辉光放电条件下采用空心阴极效应加热进行膏剂离子渗硼的工艺方法及掺硼层性能的研究，并对其渗入机理进行了分析。
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| 关 键 词： | 空心阴极 辉光放电 渗硼 膏剂 工艺 |
Research on Ionized Boronizing and Performance of Boronizing Layer by Hollow Cathode Discharge |
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| Zhao,Jingxiang,Gao,Yuan,Xu,Zhong.Research on Ionized Boronizing and Performance of Boronizing Layer by Hollow Cathode Discharge[J].Journal of Taiyuan University of Technology,1998,29(6):616-619. |
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| Authors: | Zhao Jingxiang Gao Yuan Xu Zhong |
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| Institution: | Inst. of Surface Engg. |
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| Abstract: | This paper deals with a new technology method of paste plasma boronizing by hollow cathode discharge heating.The performance of boronizing layer is studied.The permeating mechanism of paste plasma boronizing is also analyzed. |
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| Keywords: | hollow cathode discharge glow discharge boronizing |
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