| 金刚石膜同步辐射X—射线掩模的研究进展 |
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| 引用本文： | 万静,苟立,冉均国.金刚石膜同步辐射X—射线掩模的研究进展[J].四川师范大学学报(自然科学版),2001,24(6):618-621. |
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| 作者姓名： | 万静 苟立 冉均国 |
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| 作者单位： | 1. 四川大学无机非金属材料系;西南民族学院化学系
2. 四川大学无机非金属材料系 |
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| 基金项目： | 国家自然科学基金资助项目(69876026) |
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| 摘 要： | 超大规模集成电路（VLSI）线宽不断缩小促进了光刻技术的发展和分辩率的提高，缩短光波长和改进掩模是提高分辨率的重要途径，探索采用X-射线光刻技术时，用金刚石薄膜作为掩模基膜的研究现状与发展方向，金刚石薄膜因其具有优异的机械、光学和热学性能，已成为新一代掩模基膜材料的理想候选材料，介绍了金刚石薄膜用作掩模基膜材料上取得的实验成果，面临的问题和可能解决的途径。
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| 关 键 词： | 金刚石薄膜 X－射线光刻掩模 CVD沉积工艺 薄膜应力 薄膜粗糙度 |
| 文章编号： | 1001-8395(2001)06-0618-04 |
| 修稿时间： | 2001年6月25日 |
Study Progress of the Diamond Film Used as X-ray Mask |
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| WAN Jing ,GOU Li ,RAN Jun-guo.Study Progress of the Diamond Film Used as X-ray Mask[J].Journal of Sichuan Normal University(Natural Science),2001,24(6):618-621. |
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| Authors: | WAN Jing GOU Li RAN Jun-guo |
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| Institution: | WAN Jing 1,2,GOU Li 1,RAN Jun-guo 1 |
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| Abstract: | Feature sizes of VLSI are decreasing,which results in development of the photolithographic technique and its resolution. In order to develop resolution, shorting wavelength and modifying mask areimportant methods. In this paper, the present situation and development direction of diamond film used as the basic film of mask are described. It's pointed that diamond film which has excellent mechnical, optical and thermal properties is an ideal candidate of the new basic film of mask. This paper indicates the present problems and the ideas of solution. |
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| Keywords: | Diamond film X-ray photolithographic mask CVD process Thin stress Film roughness |
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