铜膜制备过程中辉光等离子体的双探针诊断

采用Langmuir双探针技术对氩气环境下射频磁控溅射铜薄膜过程中产生的辉光等离子体进行了实时诊断.结果表明,在一定的射频功率下,电子温度随气压的增大呈指数衰减的趋势变化;在一定的反应气压下,电子温度和电子密度随射频功率的增大均呈线性增加的趋势.电子的运动速度数量级为106 m/s.比离子的运动速度大3个数量级.

Diagnostic of Glow Plasma in Preparing the Cooper Film Process by Using Double Langmuir Probes

Cu films are deposited under various Ar deposition pressures by radio frequency(RF) magnetron sputtering.The glow discharge plasma generated during the sputtering of the copper target has been diagnosed by double Langmuir probes.The results show that the electron temperature decreases exponentially with the gas pressure at a certain RF power,while at a certain gas pressure,the electron temperature and the electron density increase with RF power linearly.The order of magnitude of electron velocity is 106 m/s,three times larger than the ion velocity in orders of magnitude.