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薄膜表面粗糙度对内应力测量的影响初析
引用本文:何建波,朱云贵,何百林.薄膜表面粗糙度对内应力测量的影响初析[J].合肥工业大学学报(自然科学版),2001,24(1):85-89.
作者姓名:何建波  朱云贵  何百林
作者单位:1. 合肥工业大学 化学工程学院,
2. 深圳市科技工业园,
基金项目:安徽省自然科学基金资助项目! (985 3 3 5 40 )
摘    要:薄膜表面粗糙度对内应力的测量产生复杂的影响。文章通过理论分析和计算 ,得到如下结论 :表面粗糙度使得内应力的测量值小于其真实值 ;当表面粗糙颗粒可以用球体描述时 ,粗糙度对内应力测量值的影响仅取决于球状颗粒与表平面之间的接触角 ,而与颗粒的半径大小无关 ,若颗粒恰为半球体 ,内应力测量值与实际值之比为 0 .785 4;当粗糙表面轮廓线可以用正弦曲线表示时 ,上述影响则取决于正弦波的波幅和波距之比。

关 键 词:表面粗糙度  内应力  薄膜
文章编号:1003-5060(2001)01-0085-05
修稿时间:2000年4月21日

The influence of roughness of thin film surface on the measurement of the intrinsic stress
HE Jian-bo,ZHU Yun-gui,HE Bai-lin.The influence of roughness of thin film surface on the measurement of the intrinsic stress[J].Journal of Hefei University of Technology(Natural Science),2001,24(1):85-89.
Authors:HE Jian-bo  ZHU Yun-gui  HE Bai-lin
Abstract:The influence of roughness of thin film surface on th e measurement of the intrinsic stress has been discussed theoretically. The resu lt shows that, due to the roughness of surface, the measured interface stress( f′) is always smaller than the actual one(f). For the rough surface consi sting of spherical grains, the ratio of f′/f depends on the contact angle b etween spherical grains and planar surface, independently of radius of grains. W hen all the grains on the surface are especially hemispherical, the ratio of f ′/f is 0.785 4. For the rough interface fitting in with a sinusoidal shape, t he ratio of f′/f decreases with the increase in the ratio of amplitude to w avelength of the sinusoidal wave.
Keywords:roughness of surface  intrinsic stress  thin film
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