| 厚层抗蚀剂光刻技术研究进展 |
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| 引用本文： | 郭颖,潘峰,周平和,王少华,刘世杰.厚层抗蚀剂光刻技术研究进展[J].陕西理工学院学报(自然科学版),2007,23(3):15-19. |
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| 作者姓名： | 郭颖 潘峰 周平和 王少华 刘世杰 |
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| 作者单位： | 陕西理工学院,物理系,陕西,汉中,723001 |
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| 基金项目： | 陕西理工学院校科研和教改项目;陕西理工学院教学改革项目 |
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| 摘 要： | 厚层抗蚀剂光刻是一种制作深浮雕结构的微细加工技术。综述了近年来厚层抗蚀剂光刻技术的最新进展,从厚层抗蚀剂光刻工艺原理以及计算机模拟诸方面分析了该技术区别与传统光刻的一些特点,并对其应用的研究现状进行了总结,最后指出了进一步发展厚层抗蚀剂光刻技术的关键问题。
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| 关 键 词： | 厚层抗蚀剂 光刻 模拟技术 发展趋势 |
| 文章编号： | 1673-2944（2007）03-0015-05 |
| 修稿时间： | 2007-03-26 |
On the development of the study of thick photoresist lithography techniques |
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| GUO Ying,PAN Feng,ZHOU Ping-he,WANG Shao-hua,LIU Shi-jie.On the development of the study of thick photoresist lithography techniques[J].Journal of Shananxi University of Technology:Natural Science Edition,2007,23(3):15-19. |
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| Authors: | GUO Ying PAN Feng ZHOU Ping-he WANG Shao-hua LIU Shi-jie |
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| Institution: | Deptartment of Physical Sciences,Shaanxi University of Technology, Hanzhong 723001, China |
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| Abstract: | Thick resist lithography is one kind of micromachining techniques fabricating relief microstructures at great depth.The recent new development of the technique is summarized.The characteristics of thick resist lithography technique different from those of traditional technique are analyzed on the principle of lithography process and computer simulations.Applications of the technique are also summarized.Finally,some key problems on developing thick resist lithography are pointed out. |
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| Keywords: | thick resist lithography simulation technique development direction |
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