霍尔效应对磁场作用下电化学分形沉积物形貌的影响

运用霍尔效应的原理,分析了在磁场中电化学分形沉积物形貌与无外加磁场时电化学沉积物正常生长分形明显不同的原因,解释了分形沉积物形貌变化与外加磁场的方向、强度之间的关系,半定量分析了霍尔效应对电化学分形沉积的影响程度.研究结果表明:当无外加磁场时,在分形沉积物分枝上只存在平行于分枝的正向电压;当存在外加磁场时,因为霍尔效应,在分形沉积物分枝上,除了存在平行于分枝的正向电压外还存在垂直于分枝的切向电压,使后继的形核和生长在分枝的低电位侧占优势,这是造成沉积物形貌改变的重要原因.

Influence of Hall effect on fractal morphology of electrodeposits under magnetic field

Hall effect was used to analyse the reason that the morphology of the metal fractal electrodeposits changes under magnetic field and to explain the relationship between these changes of morphology and the direction and strength of the applied magnetic field. The influence of Hall effect on metal fractal electrodeposition was also analysed half quantitatively. The results show that in the absence of magnetic field there is only the parallel voltage to the branch. In the presence of magnetic field, besides the parallel voltage, there is a lateral vertical voltage to the branch for Hall effect, which causes the new nucleation and growth towards the low potential side of the branch. Hence, the Hall effect plays an important role in the morphological change.