| 沉积温度对BC2N薄膜的生长和附着性的影响 |
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| 引用本文： | 马锡英,贺德衍,陈光华.沉积温度对BC2N薄膜的生长和附着性的影响[J].兰州大学学报(自然科学版),2001,37(5):23-29. |
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| 作者姓名： | 马锡英 贺德衍 陈光华 |
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| 作者单位： | 1. 兰州大学物理科学与技术学院,
2. 北京工业大学应用物理系, |
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| 基金项目： | 兰州大学博士启动基金(870883)资助项目. |
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| 摘 要： | 应用热丝辅助射频等离子体化学气相沉积法在硅、金刚石衬底上合成了BC2N薄膜，X－射线衍射、红外谱分析表明较高的温度有利于BC2N化合物的成核和生长。高温制备的薄膜的化学组分主要为BC2N，B，C和N原子间互相结合成键，但与硅衬底的附着力很差。选择热膨胀系数与硅接近的金刚石作为过渡层沉积BC2N多层膜，逐层提高生长温度，不仅提高生长温度，不仅提高了薄膜中BC2N的含量，而且提高了薄膜与衬底的粘 附力。
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| 关 键 词： | 衬底 化学气相沉积法 沉积温度 附着性 三元硼碳氮薄膜 |
| 文章编号： | 0455-2059(2001)05-0023-06 |
| 修稿时间： | 2000年12月9日 |
The Effect of Deposition Temperature on the Growth and Adhesion of BC2N Thin Films |
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| Ma Xiying ,He Deyan ,Chen Guanghua.The Effect of Deposition Temperature on the Growth and Adhesion of BC2N Thin Films[J].Journal of Lanzhou University(Natural Science),2001,37(5):23-29. |
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| Authors: | Ma Xiying He Deyan Chen Guanghua |
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| Institution: | Ma Xiying 1,He Deyan 1,Chen Guanghua 2 |
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| Abstract: | BC 2N thin films were deposited by hot filament assisted chemical vapor deposition (CVD) on Si and diamond substrates. The results obtained by X ray and FTIR measurements showed that high temperature was beneficial to the formation and growth of BC 2N, and the main composition in the film was BC 2N, B, C, and N atoms were bonded with each other. However, the adhesion between the film and the Si substrates was poor. In order to improve the adhesion, diamond was used as a buffer layer to deposit the multilayer BC 2N film by increasing the deposition temperature gradually. As a result, the concentration of BC 2N was found to be increased layer by layer, and the adhesion was enhanced too. |
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| Keywords: | BC 2N various substrates CVD |
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