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| 壁处理对HT-7托卡马克欧姆放电时自举电流的影响 | |
| 引用本文： | 张先梅,万宝年,王燕. 壁处理对HT-7托卡马克欧姆放电时自举电流的影响[J]. 中国科学技术大学学报, 2005, 35(6): 829-835 |
| 作者姓名： | 张先梅 万宝年 王燕 |
| 作者单位： | 1. 华东理工大学物理系,上海,200237 2. 中国科学院等离子体物理研究所,安徽,合肥,230031 3. 上海大学物理系,上海,200436 |
| 摘 要： | 分析了HT-7托卡马克壁处理前后欧姆放电时的自举电流占总等离子体电流比例的变化情况.壁处理以后,等离子体的密度分布变宽,等离子体压力梯度在边界较大,边界的电子温度比壁处理前高,从而碰撞频率降低,使得自举电流成份比例从壁处理前的小于5%增大到百分之十几.这一变化解释了壁处理后稳态放电时,等离子体电流可以轻松放大且等离子体电流分布变宽的现象. |
| 关 键 词： | 自举电流 壁处理 欧姆放电 托卡马克 |
| 文章编号： | 0253-2778（2005）06-0829-07 |
| 收稿时间： | 2003-11-24 |
| 修稿时间： | 2004-05-20 |
Study on Bootstrap Current of Ohmically Heated Discharges with Wall Conditionings in HT-7 Tokamak |
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| ZHANG Xian-mei,WAN Bao-nian,WANG Yan. Study on Bootstrap Current of Ohmically Heated Discharges with Wall Conditionings in HT-7 Tokamak[J]. Journal of University of Science and Technology of China, 2005, 35(6): 829-835 | |
| Authors: | ZHANG Xian-mei WAN Bao-nian WANG Yan |
| Affiliation: | 1. Department of Physics, East China University of Science and Technology, Shanghai 200237, China ; 2. Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China ; 3. Department of Physics, Shanghai University, Shanghai 200436 ,China |
| Abstract: | The ratio of the bootstrap current to the total plasma current IS analyzed belore and after wall conditionings of the ohmically heated discharges in the HT-7 tokamak. It is less than 5% of the total plasma current before wall conditionings, but enhanced up to more than 10% for boronization and siliconization. After wall conditionings, the plasma pressure gradient and the electron temperature near the boundary are larger than before, and collision frequency decreases. The results may help explain the previous experimental phenomena that the plasma current profile is broadened and the higher current can be obtained easily on the HT-7 tokamak experiment after wall conditionings. |
| Keywords: | bootstrap current wall conditioning ohmically heated discharge tokamak |
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