| 等离子体镀光学薄膜的数学模型 |
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| 引用本文： | 万敏利,林永昌.等离子体镀光学薄膜的数学模型[J].北京理工大学学报,1993,13(1):23-31. |
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| 作者姓名： | 万敏利 林永昌 |
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| 作者单位： | 北京理工大学工程光学系，北京理工大学工程光学系 北京 100081，北京 100081 |
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| 摘 要： | 从电离气体等离子体的基本性质入手,分析了处于等离子体中的基片表面鞘层及基片悬浮电位的形成,计算了正离子进入势垒到达基片的条件、基片的悬浮电位、到达基片的正离子流的密度,以及入射基片的正离子的能量,从而建立起等离子体镀光学膜的数学模型。
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| 关 键 词： | 数学模型 等离子体镀 光学薄膜 |
A Mathematical Model for Optical Films Deposited by Reactive Ion Plating |
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| Wan Minli Lin Yongchang.A Mathematical Model for Optical Films Deposited by Reactive Ion Plating[J].Journal of Beijing Institute of Technology(Natural Science Edition),1993,13(1):23-31. |
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| Authors: | Wan Minli Lin Yongchang |
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| Abstract: | The formation of plasma sheath and the floating potential of substrate are analysed by plasma theory. The condition of ion incident upon the substrate through potential hill, the floating potential of substrate, the ion incidence energy and density on the substrate are calculated. Thus a mathematical model for optical films deposited by the reactive ion plating process is built up. |
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| Keywords: | optical coatings plasmas mathematical models/floating potential |
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