| MPCVD法沉积金刚石薄膜中等离子体光谱 |
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| 引用本文： | 周明华 夏义本. MPCVD法沉积金刚石薄膜中等离子体光谱[J]. 应用科学学报, 1995, 13(1): 35-38 |
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| 作者姓名： | 周明华 夏义本 |
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| 作者单位： | 上海大学嘉定校区 |
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| 摘 要： | 从等离子体发射光谱变化这一角度研究在不同沉积条件下等离子体中电子平均能量的特点，分析碳源气体分析与电子的碰撞以及碳氢基团的能态变化，从而对等离子体法沉积金刚石薄膜微观机理进行初步探索。
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| 关 键 词： | 等离子体 光谱 金刚石 薄膜 沉积 |
AN INVESTIGATION OF PLASMA SPECTRUM IN THE PROCESS OF DIAMOND THIN FILM DEPOSITED BY MPCVD |
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| ZHou MINGHUA XI YIBEN ZHANG XuBAI WANG HONG. AN INVESTIGATION OF PLASMA SPECTRUM IN THE PROCESS OF DIAMOND THIN FILM DEPOSITED BY MPCVD[J]. Journal of Applied Sciences, 1995, 13(1): 35-38 |
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| Authors: | ZHou MINGHUA XI YIBEN ZHANG XuBAI WANG HONG |
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| Affiliation: | shanghai University Jiading Campus |
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| Abstract: | The charactor of the average energy of the electrons in the plasma ballgenerated by microwaves is studied by observing the spectrum of the plasma ballunder different depositing conditions.The mechanism of deposition is discussedby analyzing the collisions between electrons and hydrocarbon molecules and thechange of the hydrocarbon radicals' energy. |
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| Keywords: | diamond film plasma spectrum average energy of electrons. |
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