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Effect of Copper Content on the Direct Process of Organosilane Synthesis from Silicon and Methyl Chloride
作者姓名:罗务习  张国良  王光润  王金福
作者单位:Department of Chemical Engineering Tsinghua University Beijing 100084 China,Jilin Chemical Corporation Jilin 132022 China,Department of Chemical Engineering Tsinghua University Beijing 100084 China,Department of Chemical Engineering Tsinghua University Beijing 100084 China
摘    要:Introduction The direct process of producing methylchlorosilane was first demonstrated by Rochow1]. Rochow discov-ered that copper acts as catalyst with the normal reac-tion in the presence of copper given by: CuSi (s) 2CH 3C l( g) ??→ (CH3 )2 SiCl2 (…

关 键 词:氯甲烷    反应活性  反应选择性  气相色谱    扫描电镜
收稿时间:2004-07-16
修稿时间:2004-07-162005-11-25

Effect of Copper Content on the Direct Process of Organosilane Synthesis from Silicon and Methyl Chloride
Wuxi Luo,  , Guoliang Zhang, ý, Guangrun Wang, &#x;Ú,Jinfu Wang, .Effect of Copper Content on the Direct Process of Organosilane Synthesis from Silicon and Methyl Chloride[J].Tsinghua Science and Technology,2006,11(2):252-258.
Authors:Wuxi Luo     Guoliang Zhang  ý  Guangrun Wang   &#x;Ú  Jinfu Wang   
Institution:aDepartment of Chemical Engineering, Tsinghua University, Beijing 100084, China;bJilin Chemical Corporation, Jilin 132022, China
Abstract:The effect of copper concentration on the performance of the catalytic reaction between silicon and methyl chloride was investigated using online gas chromatogram. The catalyst concentration greatly in-fluences various aspects of the direct organosilane synthesis process, including the reaction rate, the selec-tivity, and the silicon conversion. The reaction activity and the silicon conversion increase as the catalyst concentration increases. However, the reaction selectivity decreases for the catalyst concentrations more than 9 wt.%. The cross-sections of deactivated contact mass particles were observed by optical microscopy and analyzed by scanning electron microscope combined with energy dispersive X-ray detector (SEM-EDX). The observations showed that a textured substance formed on the original flat surface of the silicon particles after deactivation with copper only in a shallow surface layer of the contact mass. This indicates that the copper diffusion is the rate limiting step which causes the reaction deactivation.
Keywords:direct process  copper concentration  reaction activity  reaction selectivity  silicon conversion  online gas chromatogram (GC)  scanning electron microscope combined with energy disper-sive X-ray detector (SEM-EDX)
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