首页 | 本学科首页   官方微博 | 高级检索  
     检索      

MoS2/TiO2纳米复合材料的制备与可见光光催化性能研究
引用本文:孙燕丽,王琼生,王世铭.MoS2/TiO2纳米复合材料的制备与可见光光催化性能研究[J].福建师范大学学报(自然科学版),2012,28(5):73-77.
作者姓名:孙燕丽  王琼生  王世铭
作者单位:1. 福建生物工程职业技术学院药学系,福建福州,350002
2. 福建师范大学材料科学与工程学院,福建福州,350108
3. 福建师范大学化学与化工学院,福建福州,350108
基金项目:福建省教育厅资助项目,福州市科技局资助项目
摘    要:采用TiO2溶胶-凝胶法制备了复合半导体MoS2/TiO2纳米材料,用XRD、UV-VIS-DRS、BET等手段对样品进行了表征,并以亚甲基蓝染料为探针分子详细讨论了MoS2掺杂量、染料初始浓度等对其光催化性能的影响.结果表明:MoS2/TiO2复合半导体纳米材料具有较好的可见光催化活性;当染料浓度为0.284mmol·L-1,催化剂用量为0.5 g·L-1,亚甲基蓝染料的光催化降解率为96.5%.

关 键 词:MoS2/TiO2  可见光  光催化  亚甲基蓝

Synthesis and Visible-light Photocatalysis of MoS2/TiO2 Compound Materials
SUN Yan-li , WANG Qiong-sheng , WANG Shi-ming.Synthesis and Visible-light Photocatalysis of MoS2/TiO2 Compound Materials[J].Journal of Fujian Teachers University(Natural Science),2012,28(5):73-77.
Authors:SUN Yan-li  WANG Qiong-sheng  WANG Shi-ming
Institution:1.Department of Pharmacology,Fujian Vocational College of Bioengineering,Fuzhou 350002,China;2.College of Materials Science and Engineering,Fujian Normal University,Fuzhou 350108,China;3.College of Chemistry and Chemical Engineering,Fujian Normal University,Fuzhou 350108,China)
Abstract:MoS2/TiO2 nanomaterial prepared by sol-gel process was characterized by XRD,UV-VIS-DRS,BET and so on.Meanwhile methylene blue(MB) was taken as the probe molecular to evaluate the visible light photocatalytic activity of the compound semiconductor materials.The effects of ration of MoS2 in composite catalyst,the initial concentration of methylene blue and the quantity of catalyst on the degradation rate of the methylene blue solution were investigated.The results show that the compound semiconductor materials exhibited the best photocatalytic activity being the decolorization proportion of methylene blue is 96.5% when the quantity of catalyst 0.5 g·L-1,the initial concentration of methylene blue is 0.284 mmol·L-1 under visible light.
Keywords:MoS2/TiO2  visible light  photocatalytic  methylene blue
本文献已被 CNKI 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号