等离子体技术净化CF4及其生成物机理的探讨

讨论了利用等离子体技术净化CF4及其生成物的方法，分析了净化机理。由四极质谱仪的分析结果发现，CF4等生成物的谱峰强度随射频(RF)功率的增加几乎线性地减小。RF功率达到1．8kW时，已检测不到CF4及其生产物对应的各个谱峰。在净化装置中放置CaO作为吸附剂，在室温下CaO对F有明显的净化作用。采用等离子体技术和化学吸附相结合处理有害气体的方法对环境保护有实际意义。

Study of Purifying Mechanism for CF4 and Products by Plasma Technique

The method and mechanism are discussed for purifying CF 4 and products by plasma technique. From quadrupole gas analyzer, the intensity of spectral peaks for CF 4 and products reduces almost linearly with increase of RF power.The peaks cannot be measured when RF power is added to 1.8 kW. From scanning electron microscope, the purification for F is obvious by CaO at room temperature. The method to combine plasma technique with chemical adsorption which is used in purifying harmful gases has practical significance for environmental protection.