| 静电辅助的气溶胶化学气相沉积法制备Y2O3薄膜 |
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| 引用本文： | 王耀华,吕反修,贺琦,李成明,唐伟忠.静电辅助的气溶胶化学气相沉积法制备Y2O3薄膜[J].北京科技大学学报,2009,31(8). |
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| 作者姓名： | 王耀华 吕反修 贺琦 李成明 唐伟忠 |
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| 作者单位： | 北京科技大学材料科学与工程学院,北京,100083 |
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| 摘 要： | 采用静电辅助的气溶胶化学气相沉积的方法成功地在Si(100)衬底上制备了Y2O3薄膜,利用X射线衍射(XRD)、场发射扫描电镜(FE-SEM)、原子力显微镜(AFM)和X射线光电子能谱(XRP)对薄膜进行了表征.SEM分析结果显示,薄膜的颗粒为纳米级的,并且薄膜致密、平整.AFM分析结果表明,薄膜的粗糙度为11nm.由XPS分析可知,薄膜为基本上符合化学计量比的氧化物.附着力测试表明,Y2O3薄膜与Si衬底的附着力为4.2N.X射线衍射分析结果表明,沉积得到的Y2O3薄膜在热处理前为非晶结构,热处理之后薄膜具有立方晶体结构,并且沿(111)面择优生长.
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| 关 键 词： | 静电辅助的气溶胶化学气相沉积 氧化钇 薄膜 粗糙度 |
Deposition of Y2O3 thin films by electrostatic spray assisted vapor deposition method |
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| WANG Yao-hua,L Fan-xiu,HE Qi,LI Cheng-ming,TANG Wei-zhong.Deposition of Y2O3 thin films by electrostatic spray assisted vapor deposition method[J].Journal of University of Science and Technology Beijing,2009,31(8). |
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| Authors: | WANG Yao-hua L Fan-xiu HE Qi LI Cheng-ming TANG Wei-zhong |
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| Institution: | WANG Yao-hua,L(U) Fan-xiu,HE Qi,LI Cheng-ming,TANG Wei-zhong |
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| Abstract: | Y2O3 thin films were successfully deposited onto Si (100) substrates by the electrostatic spray assisted vapor deposition (ESAVD) method. The films were characterized by X-ray diffraction (XRD),field emission scanning electron microscopy (FE-SEM),atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The results of FE-SEM analysis showed that Y2O3 thin films were homogeneous,uniform and nanostructural. AFM analysis indicated that Y2O3 thin films had low surface roughness (11 nm). XPS anal... |
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