| 离子镀氮化钛膜层综合剖析 |
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| 引用本文： | 韩效溪,丁正明,林行方.离子镀氮化钛膜层综合剖析[J].上海交通大学学报,1988(1). |
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| 作者姓名： | 韩效溪 丁正明 林行方 |
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| 作者单位： | 上海交通大学应用物理系，上海交通大学理化中心，上海交通大学材料科学及工程系 |
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| 摘 要： | 本文应 X 用射线光电子能谱(XPS)、俄歇电子能谱(AES)、X 射线衍射(XRD)等技术,对用空心阴极离子镀法(HCD)生长的氮化钛膜层作了综合测试,对膜层的组分和结构作了分析,着重论述了外表面氧化膜及界面过渡层的产生和作用。由 XRD 分析得知,氮化钛晶粒中与衬底有良好共格关系的那些晶面平行于膜面生长。
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| 关 键 词： | 表面分析 X 射线光电子谱法 俄歇电子谱法 X 射线衍射 氮化钛 氧化钛 薄膜 |
A Synthetic Analysis of Titanium Nitride Films by HCD Ion Plating |
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| Han Xiaoxi Ding Zhengming Lin Xingfang.A Synthetic Analysis of Titanium Nitride Films by HCD Ion Plating[J].Journal of Shanghai Jiaotong University,1988(1). |
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| Authors: | Han Xiaoxi Ding Zhengming Lin Xingfang |
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| Institution: | Han Xiaoxi Ding Zhengming Lin Xingfang |
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| Abstract: | In this paper,titanium nitride films deposited from the process of hollowcathode deposition (HCD) are synthetically measured by applying the X-rayphotoelectron spectroscopy (XPS),auger electron spectroscopy (AES) and
X-ray diffractometer (XRD) techniques.The composition and structure of films are analyzed.Especially,the existence
and action of the oxide film on the surface and of the interlaminated transitionlayer have been discussed.By the XRD analysis,we know that in the TiNcrystalline grains,those crystal faces which match well with the substrate in their
lattices are parallel to the film surface. |
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| Keywords: | surface analysis X-ray photoelectron spectrometry auger electron spectrometry X-ray diffraction titanium nitride titanium oxide thin films |
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