| 活化剂对Al－Cr扩散层中孔穴形成的影响 |
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| 引用本文： | 曹铁梁,耿伟民,倪政瑜,周庆初,潘辉英.活化剂对Al－Cr扩散层中孔穴形成的影响[J].北京科技大学学报,1996(Z2). |
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| 作者姓名： | 曹铁梁 耿伟民 倪政瑜 周庆初 潘辉英 |
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| 作者单位： | 中国科学院上海冶金研究所 |
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| 摘 要： | Ｎｉ衬底用粉末包装法先扩散Ａｌ再扩散Ｃｒ时，在Ａｌ—Ｃｒ扩散层内产生了孔穴。它形成的原因是：活化剂ＮＨ４Ｃｌ加热分解时生成ＨＣｌ气体，与已形成扩散层中的Ａｌ作用，使其从扩散层中逃逸，而在原来Ａｌ的位置上产生了孔穴。含有孔穴的Ａｌ－Ｃｒ扩散层的抗氧化能力明显降低。
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| 关 键 词： | 卤化物活化剂，Al－Cr扩散层，孔穴 |
Influence of Activators on Formation of Voids in Aluminum-Chromium Diffusion Coatings |
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| Cao Tieliang,Geng Weimin, Ni Zhengyu,Zhou Qingchu,Pan Huiying,.Influence of Activators on Formation of Voids in Aluminum-Chromium Diffusion Coatings[J].Journal of University of Science and Technology Beijing,1996(Z2). |
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| Authors: | Cao Tieliang Geng Weimin Ni Zhengyu Zhou Qingchu Pan Huiying |
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| Abstract: | Aluminum-chromium diffusion coatings on pure nickel substrate were formed by two-step pack cementation process. It was found that existed many voids in the coatings which were formed by first aluminizing and then chromizing. It could be understood that aluminum in the coatings reacted with HCL gas decomposed from activator NH4CL and formed ACL3,which evaporated and resulted in formation of the voids.Oxidation resistance of Al-Cr coating with these voids was reduced signigicantly. |
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| Keywords: | halide activator Al-Cr diffusion coatings voids |
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