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BiFeO_3薄膜的so-lgel制备及其铁电性能研究
引用本文:陈芳,李超,叶万能.BiFeO_3薄膜的so-lgel制备及其铁电性能研究[J].湖北大学学报(自然科学版),2010,32(4):414-417.
作者姓名:陈芳  李超  叶万能
作者单位:[1]空军第一航空学院物理教研室,河南信阳464000 [2]青岛大学纤维新材料与现代纺织国家重点实验室培育基地,山东青岛266071
摘    要:采用sol-gel方法在Pt(111)/Ti/SiO2/Si(100)衬底上制备出了(100)择优取向的BiFeO3薄膜.XRD研究表明,600~650℃退火的薄膜结晶较好.AFM形貌显示,650℃退火的薄膜中等轴状晶粒大小均匀(直径100~150nm),薄膜较为致密.电学性能测量结果表明,650℃退火、厚度为840nm的薄膜的2Pr值为2.8mC/cm2;在50kV/cm外加电场下,漏电流为2.7×10-5 A/cm2.电流-电压特性显示,在欧姆区之上,薄膜的主要导电机制为波尔-弗兰克尔发射导电.

关 键 词:溶胶-凝胶  BiFeO3薄膜  铁电性  导电机理

Sol-gel preparation and electric properties of BiFeO3 thin films
CHEN Fang,LI Chao,YE Wanneng.Sol-gel preparation and electric properties of BiFeO3 thin films[J].Journal of Hubei University(Natural Science Edition),2010,32(4):414-417.
Authors:CHEN Fang  LI Chao  YE Wanneng
Institution:1.Physics Teaching and Research Department,The First Aeronautical College of Air Force,Xinyang 464000,China; 2.Laboratory of Fiber Materials and Modern Textile,The Growing Base for State Key Laboratory, Qingdao University,Qingdao 266071,China)
Abstract:BiFeO3 thin films of(100) preferential orientation were deposited through sol-gel process on(111)Pt/Ti/SiO2/(100)Si substrates.X-ray diffraction pattern indicates that good annealing temperature of films are 600~650 ℃.The dense thin film annealed at 650 ℃was composed of uniformed grains with equiaxed shape(100~150 nm in diameter).The film(840 nm) annealed at 650 ℃ show very low remanent polarization(2Pr) of 2.8 mC/cm2 and large leakage current of 2.7×10-5 A/cm2 at 50 kV/cm.The main conduction mechanism of the thin films is Poole-Frankel emission conduction above the ohmic region.
Keywords:sol-gel  BiFeO3 film  ferroelectricity  conduction mechanism
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