磁性薄膜自发磁化强度的变分累计展开分析 |
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引用本文: | 周亚非.磁性薄膜自发磁化强度的变分累计展开分析[J].渝西学院学报(自然科学版),2004,3(4):18-20. |
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作者姓名: | 周亚非 |
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作者单位: | 渝西学院物理学与电子信息工程系 重庆永川402168 |
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基金项目: | 重庆市教委科学技术研究项目 (批准号 :0 3 12 0 2 )资助 |
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摘 要: | 利用变分累计展开方法,分析了Heisenberg磁性薄膜的自发磁化强度到三级累积展开,结果表明:自发磁化强度依赖于薄膜的层数,在某一临界厚度以下,自发磁化强度随薄膜原子层数的减小而迅速减小,其结果与实验数据接近。
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关 键 词: | Heisenberg薄膜 自发磁化强度 变分累计展开 |
Analytical Study of Spontaneous Magnetization with Variational Cumulant Expansion in Magnetic Thin Film |
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Authors: | ZHOU Ya-fei |
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Abstract: | The magnetic properties of quantum Heisenberg film is studied in variational cumulant expansion method. The spontaneous magnetization is calculated to the third order. For thicknesses below a critical thickness , the spontaneous magnetization depends on the number of atomic layers and decreases rapidly as the number of atomic layers is decreased. The results are consistent with experimental facts. |
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Keywords: | quantum Heisenberg film spontaneous magnetization variational cumulant expansion |
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