| 真空镀膜膜厚均匀性的理论分析 |
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| 引用本文： | 徐力,吕江. 真空镀膜膜厚均匀性的理论分析[J]. 天津理工大学学报, 1999, 0(Z1) |
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| 作者姓名： | 徐力 吕江 |
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| 作者单位： | 天津理工学院基础教育学院 |
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| 摘 要： | 就真空镀膜机内几何配置对薄膜均匀性的影响进行了理论分析，得到了对实际工作具有参考价值的结论：调整真空室内的几何配置可以获得最佳的薄膜均匀性
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| 关 键 词： | 薄膜；均匀性；几何配置 |
Theoretic Analysis on the Uniformity of Thin Films Disposited by Means Coater |
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| XU Li LU Jiang. Theoretic Analysis on the Uniformity of Thin Films Disposited by Means Coater[J]. Journal of Tianjin University of Technology, 1999, 0(Z1) |
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| Authors: | XU Li LU Jiang |
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| Abstract: | This paper analyzes theoretically the effect of the geometric disposition inside the vacuum coater on thin film uniformity. The conclusion that the best thin film uniformity can be achieved by adjusing the geometric disposition of the vacuum chamber is pointed. |
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| Keywords: | thin film uniformity geometric disposition |
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