| LICVD法纳米硅粉的制备及激光能量阈值研究 |
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| 引用本文： | 范素芹,吕红霞.LICVD法纳米硅粉的制备及激光能量阈值研究[J].河北科技大学学报,2004,25(3):38-41. |
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| 作者姓名： | 范素芹 吕红霞 |
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| 作者单位： | 邯郸职业技术学院,河北邯郸,056000 |
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| 基金项目： | 国家自然科学基金资助项目(50242008) |
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| 摘 要： | 利用自制的LICVD法纳米粉设备对在不同反应气体流量和SiH4含量条件下的激光能量阈值进行了研究,对由该方法在不同反应气体流速条件下制备的纳米硅颗粒进行了微结构表征,同时就反应气体流量对纳米硅颗粒的微结构影响机制进行了探讨。
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| 关 键 词： | 激光诱导化学沉积法 能量阈值 微结构 影响机制 |
| 文章编号： | 1008-1542(2004)03-0038-03 |
| 修稿时间： | 2004年4月9日 |
Nano-silicon Powder Produced by LICVD and Study of Laser Threshold Limit Value |
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| FAN Su-qin,L Hong-xia.Nano-silicon Powder Produced by LICVD and Study of Laser Threshold Limit Value[J].Journal of Hebei University of Science and Technology,2004,25(3):38-41. |
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| Authors: | FAN Su-qin L Hong-xia |
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| Abstract: | The relationship between reactive gas flow rate and laser threshold limit value under the same silicane consistence, and the relationship between reactive gas consistence and laser threshold limit value under the same reactive gas flow rate are investigated by using device made by ourselves. Microstructure of nano-silicon particle prepared at different reactive gas flow rates is studied.The influence mechanism of reactive gas flow rate on the micro-structure of nano-particle is further analyzed. |
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| Keywords: | LICVD laser threshold limit value microstructure influence mechanism |
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