不同氩气流量下溅射所得TiO_x薄膜的结构和光学性能

为探究不同氩气流量对TiOx薄膜结构和光学性能的影响,采用常温反应磁控溅射法,在K9双面抛光玻璃基底上制备TiOx薄膜样品,利用X线衍射分析样品的晶体结构,通过原子力显微镜观察样品表面结构,使用光栅光谱仪测试样品透射率,并计算得到薄膜沉积速率和消光系数等光学参数.实验结果表明:氩气流量对TiOx薄膜的光学性能具有较为明显的影响,随着氩气流量的增加,薄膜的光学厚度和沉积速率随之增加,而折射率有微小增加,消光系数受氩气流量的影响不大.

Influence of Ar flow on optical properties of titanium oxide films by sputtering

To investigate the effects of argon flow on the structure and optical properties, the titanium dioxide films were deposited on polished K9 glass substrates at room temperature using reactive magnetron sputtering. Crystalline structure of the films was investigated by X-ray diffraction （XRD）. Surface morphology was observed by atomic force microscopy （AFM）. The grating spectrometer was employed to measure transmittance spectra, which were utilized to analyze optical constants such as refractive index and thickness of the films based on the envelope method. The results show that deposition rate of the films increase with the increasing argon flow while argon flow has little effects on the extinction coefficient of the films.