常压质谱中的化学干扰来源研究

重点对常压质谱(API-MS)自身产生的背景噪声进行分析,并对其来源进行解析.通过对不同厂家生产的API-MS进行测试.结果表明,其质谱图背景噪声中的碎片离子主要来自邻苯二甲酸二乙酯(DEP)、邻苯二甲酸二丁酯(DBP)、邻苯二甲酸苄基丁基酯(BBP)和邻苯二甲酸二异辛酯(DEHP)等酞酸酯类化合物与十甲基环五硅氧烷(D5)和十二甲基环六硅氧烷(D6)等硅酮类化合物,这些化合物很可能来自离子源中聚合材料制成的部件(如O型橡皮圈等).这些仪器自身产生的背景噪声可以影响样品中如酞酸酯类和缩氨酸类等化合物的分析检出,因此需要在分析过程充分考虑到此类背景噪声的影响,并采取相应措施降低和消除背景干扰.

Origin of the Chemical Noise in Ambient Mass Spectrometry

The instrumental background of ambient mass spectrometry(API-MS) is analyzed and the possible potential origins of the background noise is identified. According to the mass spectra obtained using the API-MS instruments by different manufacturers, the characteristic fragment ions all indicated that the background noise are resulted from the phthalates such as diethyl phthalate (DEP), dibutyl phthalate (DBP), benzyl butyl phthalate (BBP), bis(2-ethylhexyl) phthalate (DEHP), and silicones such as decamethylcyclopentasiloxane (D5) and dodecamethylcyclohexasiloxane (D6). These chemicals are probably released from the polymeric materials used in the ionization sources, such as O-type sealing ring etc. In addition, the instrumental background has to be considered especially during the analysis of phthalate and peptide compounds.