长波和甚长波及其双色InAs/GaSb二类超晶格红外探测器的研究进展

本文报道了基于InAs/GaSb二类超晶格实现长波、甚长波及窄带长波/甚长波双色红外探测器的研究,生长的材料具有极高的材料质量.长波探测器单管器件在77 K条件下50%截止波长为9.6μm,峰值响应为3.2 A/W,峰值量子效率为51.6%;甚长波红外探测器单管器件在77 K条件下50%截止波长为14.5μm,量子效率为14%,热噪声限制的探测率为4.3×109 cm Hz1/2 W-1.通过改变偏压极性实现双色探测的窄带型长波/甚长波InAs/GaSb二类超晶格红外探测器两端器件,偏压小于0 V时在长波区工作,偏压大于40 mV时,在甚长波区工作.具体来说,偏压为-0.1 V时,器件光响应50%截止波长为10μm;而偏压为40 mV时,器件光响应50%截止波长为16μm.对于长波光响应,δλ/λ为44%,对于甚长波响应,δλ/λ为46%.甚长波对长波的串音为9.9%,长波对甚长波的串音为11.8%.     

新型低维结构锑化物红外探测器的研究与挑战

红外光电探测器已经历了半个多世纪的发展,先后出现了机械扫描式单元及线列探测器和凝视型红外焦平面探测器两代探测器技术,并形成了一个庞大的红外探测器器件家族.近年来人们逐渐提出了以高探测率、大面阵、低成本、多光谱为技术特点的第三代红外探测器概念.锑化物红外探测材料以其具备的优越光电性能:量子效率高,暗电流小,微带带隙可调,均匀性高、成本低等,成为第三代红外焦平面探测器的最优选材料.本文回顾了近年来国内外第三代红外探测器材料与器件的研究发展历程,重点阐明了锑化物II类超晶格红外探测材料在技术上的优势及其国内外发展现状.通过分析个多个重点研究机构的技术发展历程,阐明了锑化物材料与器件研究的发展趋势,面临的挑战以及今后数年内该领域的研究重点.     

Mn掺杂GaSb的电子结构和光学性质

采用第一性原理方法,交换关联泛函采用局域密度近似,并对计算体系电子的库仑能进行了修正,即采用LDA+U的方法计算研究了Mn掺杂GaSb半导体材料的能带结构和光学性质.研究结果表明:Mn掺杂GaSb体系(Mn-GaSb)的光学性质得到了有效改善,大大提升了对红外光区、远红外光区光子的吸收幅度,其中Mn替代Ga(Mn@Ga)缺陷对改善GaSb半导体材料的光学性能最为明显.Mn掺杂引入的杂质能级有效降低了掺杂体系的禁带宽度,Mn@Ga缺陷的引入增强了GaSb体系的电极化能力和对红外光区光子的吸收.Mn元素的掺入浓度及Mn元素的掺杂位置对Mn@Ga缺陷体系的光学性能均有影响,最佳Mn原子掺杂摩尔比为12.5%,此时Mn@Ga缺陷体系的光学吸收谱在红外光区的吸收幅度最大,同时均匀掺杂避免了光生电子-空穴对复合中心的形成,有效提高了GaSb半导体材料对红外区、远红外区光子的吸收转换效率和GaSb半导体材料的光催化性能.     

Comparison of short period InAs/GaSb superlattices on GaSb and GaAs substrates

Type Ⅱ superlattices(SLs) short period InAs(4ML)/GaSb(8ML) were grown by molecular-beam epitaxy on lattice-mismatched GaAs substrates and on GaSb substrates.A smooth GaSb epilayer was formed on GaAs substrates by inserting mulit-buffer layers including an interfacial misfit mode AlSb quantum dot layer and AlSb/GaSb superlattices smooth layer.SLs grown on GaAs substrates(GaAs-based SLs) showed well-resolved satellite peaks in XRD.GaSb-based SLs with better structural quality and smoother surface showed strong photoluminescence at 2.55μm with a full width at half maximum(FWHM) of 20 meV,narrower than 31 meV of GaAs-based SLs.Inferior optical absorption of GaAs-based SL was observed in the range of 2-3μm. Photoresponse of GaSb-based SLs showed the cut-off wavelength at 2.6μm.     

液态GaSb材料的研究现状与展望

综述液态GaSb材料的研究现状，指出GaSb熔体黏度的学术意义在于反映了GaSb熔体的微观结构和特性，并对今后的研究工作进行了展望。     

MBE growth of high absorption mid-IR type-II InAs/GaSb superlattices

Two kinds of short-period type II superlattices(SLs)InAs(6 monolayers(MLs))/GaSb(3 MLs)and InAs(8 MLs)/GaSb(8 MLs)which can serve for mid-infrared(MIR)detection have been grown by molecular beam epitaxy(MBE)on p-type GaSb(100)substrates.The cutoff wavelength for the two superlattices(SLs)was found to be around 4.8 lm at 300 K.The high resolution X-ray diffraction(HRXRD)measurements indicated that the InAs(8 MLs)/GaSb(8 MLs)SLs have better crystalline quality than that of the InAs(6 MLs)/GaSb(3 MLs)SLs.However,compared with infrared absorption in the 2.5–4.3 lm range,the optical absorption of InAs(6 MLs)/GaSb(3MLs)SLs was more excellent.This can be attributed to increase probability of the electron and hole wave function overlap in the thinner period thickness.     

第一性计算锑化镓中的缺陷态

基于密度函数理论和广义梯度近似原理,计算了锑化镓(Ga Sb)体结构中的不同缺陷的形成能。计算结果表明,无论是在Ga-rich晶体条件下还是Sb-rich晶体条件下,主要的缺陷都是空位缺陷VGa和反应缺陷GaSb,这解释了Ga Sb在不同生长条件下总是P型半导体的原因。     

Dark current mechanism of unpassivated mid wavelength type II InAs/GaSb superlattice infrared photodetector

We investigate the dark current mechanism for an unpassivated mid wavelength(MW) type II InAs/GaSb superlattice infrared photodetector by doing the variablearea diode tests. The bulk resistance-area product and the resistivity due to the surface current are determined to be17.72 X cm2 and 704.23 X cm at 77 K, respectively. It is found that for all the mesa sizes used, the dark current is dominated or predominated by the surface component, and with scaling back the mesa size, the surface current increases while the bulk component decreases. The activation energy is determined to be 145 meV for the temperature range around 140–280 K, while it is 6 meV when temperature is below 100 K. It is also found that the dark current is dominated by the generation-recombination current for the MW device when temperature is between140 and 280 K.     

Multistage interband cascade photovoltaic devices with a bandgapof 0.23 eV operating above room temperature

Interband cascade （IC） photovoltaic （PV）device structures, consisting of multiple discrete InAs/GaSb superlattice absorbers sandwiched between electronand hole barriers, were grown by molecular beam epitaxy.Details of the molecular beam epitaxy growth and materialcharacterization of the structures are presented. The dis-crete absorber architecture enables certain advantages, suchas high open-circuit voltage, high collection efficiency,high operating temperature, and smooth integration ofcascade stages with different bandgaps. The two- andthree-stage ICPV devices presented in this article operate atroom temperature with substantial open-circuit voltages ata cutoff wavelength of 5.3 μm （corresponding to a bandgapof 0.23 eV）, the longest ever reported for room temperaturePV devices. The device characteristics indicate a high levelof current matching and demonstrate the advantages of theinterband cascade approach in thermophotovoltaic celldesign.